Dr Kaushal Vora

Vora, Kaushal profile
Department Electronic Materials Engineering
Research group Semiconductor optoelectronics and nanotechnology group
Qualifications ME, PhD (La Trobe University)
Office phone (02) 612 51594
Email
Office Physics New 3 29

Biography

Kaushal Vora received his BE in Electrical Engineering in 1996 from Saurashtra University, India. He then earned a Masters degree in Microsystems Technology in 2004 from Swinburne University of Technology, Australia. His master’s thesis was focused on integrating microfludic channel with an optical waveguide to create a low-cost biosensor. He acquired PhD degree in 2009 from La Trobe University, Australia during which he developed processes to fabricate densely-packed high aspect-ratio microstructures using x-ray lithography. He worked as an Research Officer at La Trobe University, whereby, he was involved in design, fabrication and testing of x-ray optics for phase-contrast imaging using µ-XCT. Kaushal joined The Australian National University (ANU) in 2009 as a process engineer for ANFF ACT node. Since then, he has developed a wide range of processes for our flagship equipment that includes Electron Beam/Thermal Evaporator, Inductively Coupled Plasma Etching, Nano Imprint Lithography/Hot Embossing, Plasma Enhanced Chemical Vapour Deposistion and our Sputter system.

Research interests

Micro/nano fabrication of silicon and III-V based devices, thin-film deposition and patterning of metal and insulator layers, optical waveguides, solar-cell devices, p-silicon nanowire growth and nano-replication techniques.