In this seminar I present my research focus on the materials and nanofabrication of photonic devices, mostly carried out at the ANFF-ACT node. Various materials have been utilized, ranging from metals (silver, gold, aluminium), semiconductors (crystalline silicon, germanium), to dielectrics (hydrogenated amorphous silicon, Si-rich nitride, TiO2, SiNx, TeO2, SiO2, chalcogenides). These materials are formed on various substrates as thin films using physical- and chemical-vapour deposition in which their properties are much dependent on growth parameters. Lift-off and plasma etching following electron beam lithography (EBL), are conventionally employed in nanostructure patterning. In addition, non-conventional patterning techniques - dielectric lift-off and resist tone-reversal have been developed for high aspect ratio TiO2 nano-pillars and tubes, which are difficult to fabricate in nominal method. The produced devices are demonstrated as colour filters, flat lens for visible and infrared, highly sensitive chemical sensors, just name a few. They are also apparatuses to validate new physics theory. At the end I want to give small tips to device designers what should be considered for practicable design.