Dr Tom Ratcliff
Department |
Electronic Materials Engineering |
---|---|
Office phone |
50362 |
Email |
|
Office |
Cockcroft 4 41 |
Research publications
Journal article
Lim S, Warrender J, Notthoff C, Ratcliff T, Williams J, Johnson B
Room temperature electrical characteristics of gold-hyperdoped silicon
Journal of Applied Physics 135, 9(2024)
Room temperature electrical characteristics of gold-hyperdoped silicon
Journal of Applied Physics 135, 9(2024)
Nandi S, Nath S, Das S, Murdoch B, Ratcliff T, McCulloch D, Elliman R
Effect of Interdiffusion and Crystallization on Threshold Switching Characteristics of Nb/Nb2O5/Pt Memristors
ACS Applied Materials and Interfaces 15, 50(2023) 58613 - 58622
Effect of Interdiffusion and Crystallization on Threshold Switching Characteristics of Nb/Nb2O5/Pt Memristors
ACS Applied Materials and Interfaces 15, 50(2023) 58613 - 58622
Salek A, Le P, Partridge J, Raeber T, Haberl B, Boehler R, Murdoch B, Bradby J, Ratcliff T, Elliman R, McKenzie D, McCulloch D
The structure and electronic properties of tetrahedrally bonded hydrogenated amorphous carbon
Applied Physics Letters 122, 18(2023)
The structure and electronic properties of tetrahedrally bonded hydrogenated amorphous carbon
Applied Physics Letters 122, 18(2023)
Das S, Nandi S, Marquez C, Rua A, Uenuma M, Puyoo E, Nath S, Albertini D, Baboux N, Lu T, Liu Y, Haeger T, Riedl T, Ratcliff T, Elliman R
Physical Origin of Negative Differential Resistance in V3O5 and Its Application as a Solid-State Oscillator
Advanced Materials 35, 8(2022) 2208477
Physical Origin of Negative Differential Resistance in V3O5 and Its Application as a Solid-State Oscillator
Advanced Materials 35, 8(2022) 2208477
Jun Lee W, Adeyemi Salawu Y, Kim H, Jang C, Kim S, Ratcliff T, Elliman R, Yue Z, Wang X, Lee S, Jung M, Rhyee J
Possible permanent Dirac- to Weyl-semimetal phase transition by ion implantation
Asia Materials NPG 14, 1(2022) 1-8
Possible permanent Dirac- to Weyl-semimetal phase transition by ion implantation
Asia Materials NPG 14, 1(2022) 1-8
Nandi S, Das S, Cui Y, El Helou A, Nath S, Ratcliff T, Raad P, Elliman R
Thermal Conductivity of Amorphous NbOx Thin Films and Its Effect on Volatile Memristive Switching
ACS Applied Materials and Interfaces 14, 18(2022) 21270 - 21277
Thermal Conductivity of Amorphous NbOx Thin Films and Its Effect on Volatile Memristive Switching
ACS Applied Materials and Interfaces 14, 18(2022) 21270 - 21277
Nandi S, Puyoo E, Nath S, Albertini D, Baboux N, Das S, Ratcliff T, Elliman R
High Spatial Resolution Thermal Mapping of Volatile Switching in NbOx-Based Memristor Using In Situ Scanning Thermal Microscopy
ACS Applied Materials and Interfaces 14, 25(2022) 29025-29031
High Spatial Resolution Thermal Mapping of Volatile Switching in NbOx-Based Memristor Using In Situ Scanning Thermal Microscopy
ACS Applied Materials and Interfaces 14, 25(2022) 29025-29031
Nath S, Nandi S, Ratcliff T, Elliman R
Engineering the Threshold Switching Response of Nb2O5?Based Memristors by Ti Doping
ACS Applied Materials and Interfaces 13, 2(2021) 2845-2852
Engineering the Threshold Switching Response of Nb2O5?Based Memristors by Ti Doping
ACS Applied Materials and Interfaces 13, 2(2021) 2845-2852
Nandi S, Nath S, El-Helou A, Li S, Ratcliff T, Uenuma M, Raad P, Elliman R
Electric Field- And Current-Induced Electroforming Modes in NbOx
ACS Applied Materials and Interfaces 12, 7(2020) 8422-8428
Electric Field- And Current-Induced Electroforming Modes in NbOx
ACS Applied Materials and Interfaces 12, 7(2020) 8422-8428
Nath S, Nandi S, El-Helou A, Liu X, Li S, Ratcliff T, Raad P, Elliman R
Schottky-Barrier-Induced Asymmetry in the Negative-Differential-Resistance Response of Nb/NbOx/Pt Cross-Point Devices
Physical Review Applied 13, 6(2020) 1-10
Schottky-Barrier-Induced Asymmetry in the Negative-Differential-Resistance Response of Nb/NbOx/Pt Cross-Point Devices
Physical Review Applied 13, 6(2020) 1-10
Ratcliff T, Fong K, Shalav A, Elliman R, Blakers A
The effect of annealing ambient on carrier recombination in boron implanted silicon
Physica Status Solidi: Rapid Research Letters 8, 10(2014) 827-830
The effect of annealing ambient on carrier recombination in boron implanted silicon
Physica Status Solidi: Rapid Research Letters 8, 10(2014) 827-830
Ratcliff T, Shalav A, Fong K, Elliman R, Blakers A
Influence of implantation damage on emitter recombination
Energy Procedia 55(2014) 272-279
Influence of implantation damage on emitter recombination
Energy Procedia 55(2014) 272-279
Yang X, MacDonald D, Fell A, Shalav A, Xu L, Walter D, Ratcliff T, Franklin E, Weber K, Elliman R
Imaging of the relative saturation current density and sheet resistance of laser doped regions via photoluminescence
Journal of Applied Physics 114, 5(2013) 6
Imaging of the relative saturation current density and sheet resistance of laser doped regions via photoluminescence
Journal of Applied Physics 114, 5(2013) 6
Conference paper
Shalav A, Henderson C, Ratcliff T, Thomson A
Ion implanted dielectric films for an improved optical and electronic silicon photovoltaic response
2012 MRS Fall Meeting 1493(2013) 105-110
Ion implanted dielectric films for an improved optical and electronic silicon photovoltaic response
2012 MRS Fall Meeting 1493(2013) 105-110
Listing does not show publications before 2000
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