Departmental Seminar

Micro Hollow Cathode Discharge (MHCD) in Ar /N2 used for nitride synthesis

Dr Claudia Lazzaroni
Université Sorbonne Paris Cité
Wednesday 13 July 2016 2–3pm
Oliphant Link Building Seminar Room

The study of a Micro Hollow Cathode Discharge (MHCD) deposition reactor of hexagonal boron nitride (h-BN), in nitrogen atmosphere (N2), will be presented. h-BN is a strategic material for strong added value applications, such as photonics and electronics. MHCDs allow high electron densities and therefore high dissociation degree of nitrogen to be reached which is particularly suited for nitride deposition given the high bond energy of molecular nitrogen. A global model of a one hole MHCD in Ar/N2 has been developed and will be presented.  The model is run until the steady state is reached and we obtain the plasma parameters such as the species densities and the electron temperature. A particular attention is given to the atomic nitrogen density, a key parameter for the deposition and growth of nitride films


Dr Cormac Corr

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