, Fong K, Shalav A, Elliman R
, Blakers AThe effect of annealing ambient on carrier recombination in boron implanted siliconPhysica Status Solidi: Rapid Research Letters 8
, Shalav A, Fong K, Elliman R
, Blakers AInfluence of implantation damage on emitter recombinationEnergy Procedia 55
Yang X, MacDonald D, Fell A, Shalav A, Xu L, Walter D, Ratcliff T
, Franklin E, Weber K, Elliman RImaging of the relative saturation current density and sheet resistance of laser doped regions via photoluminescenceJournal of Applied Physics 114
Shalav A, Henderson C, Ratcliff T
, Thomson AIon implanted dielectric films for an improved optical and electronic silicon photovoltaic response2012 MRS Fall Meeting 1493
Listing does not show publications before 2000
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