A high current, high-energy NEC tandem accelerator for ion-implantation and ion-beam modification of materials research. This machine uses a SNICS II ion source to produce negative ions. These are mass analyzed and accelerated to the terminal potential (maximum 1.7 MV) before passing through a gas stripper to produce a range of positive ions for subsequent acceleration. Selected ions are electrostatically scanned over a defined area on the sample. Samples can be heated or cooled during irradiation.

Equipment description (local access only)
Instructions for use (local access only)